等离子清洗用射频电源自动阻抗匹配解析调谐法

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中图分类号：TB9;TP272 文献标志码：A文章编号：1674-5124（2025）08-0013-08

Abstract： To solve the problem of long matching time for RF power supply impedance matcher for plasma cleaning，an analytical tuning method of automatic impedance matching for L-type matching network is proposed in this paper.Based on the reflection coeffcient information provided by RF VI probe in the RF system， the formula of matching network parameters required for impedance matching under various loads is deduced theoretically.Finally， the impedance matching between the RF power supply system and the vacuum plasma cavity load is realized by adjusting the capacitance of the adjustable capacitor in the control part. In order to verify the reliabilityofthe algorithm，Matlab/Simulink simulation is built to verify that the algorithm has a faster running speed than the traditional inteligent algorithm. The simulation results show that the analytical tuning method can reduce the mode of the reflection coefficient to O.01 at about 10ms . The output voltage and output current waveform were captured by the actual computer experiment， and the positive and negative power and reflection coefficient were monitored. The reflection coefficient mode of 13.56 MHz RF power supply system under 500W output power was 0.1O4. The results showed that the analytical tuning method could wellcope with the load impedance changes of vacuum plasma cavity，and the impedance matching effect was good.The stable ionization of plasma is ensured and the plasma cleaning effect is optimized.

Keywords： plasma cleaning; radio frequency; impedance matching; analytical method; automatic tuning

0 引言

等离子体是自然界中区别于固、液、气三种状态外的另一种物质。（剩余9908字）