La/Cl掺杂 CeO₂ 磨料的制备及其抛光性能研究

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文章编号：2096-2983（2025）05-0064-08

关键词：化学机械抛光； CeO2 ；La掺杂；Cl掺杂；抛光性能中图分类号：TQ133.3 文献标志码：A

Preparation and polishing performance study of La/ Cl-doped CeO2 abrasives

（1.SchoolofMaterialsandChemistry，UniversityofShanghai forScienceandTechnology，Shanghai2Oo93，China; 2.Baotou Tianjiao Seimi Polishing Powder Co.，Ltd.， Baotou O14030， China）

Abstract： In order to investigate the influence of La and Cl doping on the polishing performance of CeO2 polishing powder， the precipitation method was used with chlorinated rare earth as the cerium source. By changing the doping amount of La and the number of washes， CeO2 samples with different La doping amounts and different Cl doping amounts based on a La doping amount of 35% （molar fraction） were prepared. The Cl content in the samples after multiple washes was determined using the AgNO3 colorimetric method. The results showed that after filtering and washing 5 times， the Cl content in the samples tended to be stable. After high-temperature calcination， CeO2 samples with different Cl doping amounts were obtained. Various characterization methods were used to analyze the structure， morphology and chemical properties of the samples. The results indicated that no second phase was generated in the doped samples， maintaining the original crystal structure of CeO2 . The doping of La caused the morphology of CeO2 to tend towards a mixture of plate-like and granular， and confirmed that La3+ and Cl- successfully entered the CeO2 lattice. The performance of each sample was evaluated through polishing tests， and it was found that the CeO2 sample doped with only 35% La had the most stable and continuous polishing effect， with a material removal rate of 644.978nm/min. （2

Keywords： chemical-mechanical polishing; CeO2 ; La doping； Cl doping; polishing performance

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