硅酸镁铝吸附材料去除DSP聚醚中过渡金属离子性能研究

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中图分类号：X76 文献标志码：A 文章编号：1673-3851（2025）09-0634-12

Reference Format： WANG Jianning，GU Yan， WANG Gangqiang，et al. Research on the performance of magnesiumaluminum silicateadsorbentmaterials in removing transition metalionsfrom DSP polyetherJ].Journalof Zhejiang Sci-Tech University，2025，53（5） ：634-645.

Research on the performance of magnesium-aluminum silicate-adsorbent materials in removing transition metal ions from DSP polyether

WANG Jianning1 ，GU Yan² ，WANG Gangqiang1，2 ，JIN Yifeng³ ，LU Wangyang1 ，LI Nan1 （1.National Engineering Lab for Textile Fiber Materials and Processing Technology， Zhejiang SciTech University， Hangzhou 310ol8， China； 2.Keyi College of Zhejiang Sci-Tech University， Shaoxing 312369，China；3. Zhejiang Huangma Technology Co.，Ltd.，Shaoxing 3l2363，China）

Abstract： Diphenyl styryl phenol polyoxyethylene ether（DSP polyether），a specialized surfactant employed in photoresist developers，inherently introduces transition metal ion impurities during synthesis. To address this issue， magnesium-aluminum silicate-adsorbents with diferent magnesium-aluminum ratios were synthesized via hydrothermal methods and characterized using SEM， TEM，BET，and XPS. Their adsorption performance was systematically evaluated under varying synthesis parameters and operational conditions. Results demonstrated the optimal performance at a magnesium-aluminum feed ratio of 5：1 ， where 30mg of the adsorbent achieved 95.6% Fe（I）removal from a 15mg/L solution within 30 minutes. In acidic environments （ ⋅pH 2–6） ，the material maintained excellent adsorption efficiency and recyclability. Magnesium-aluminum silicate （n（Mg）/n（Al）=5：1） ）exhibited outstanding removal capability for Fe（I） ， Cu（II） and Zn（II） ，achieving a 95% removal rate for transition metal ions in the DSP polyether system. Further studies found that the magnesium-aluminum silicate material could remove transition metal ions through three mechanisms： electrostatic atraction， physical adsorption and chemical adsorption. This synthesis strategy，combined with robust adsorption efficacy，offers a practical approach for eliminating transition metal contaminants in DSP polyether systems.

Key Words： DSP polyether; transition metal ions; semiconductor cleaning; aluminium-magnesium silicates；adsorption

0 引言

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