薄壳元件的磁控磁流变弹性体均匀抛光

  • 打印
  • 收藏
收藏成功


打开文本图片集

Magnetorheological elastomer uniform polishing method for shell components

(1. College ofMechanical and Electrical Engineering,Northeast Forestry University, Harbin 150040, China;

2.Sichuan Precision and Ultra-Precision Machining Engineering Technology Center, Chengdu610200,China) * Corresponding author,E-mail: suxinghit@l26.com; haikuo_6s@l26.com

Abstract:This study introduces anovel uniform polishing method for the ultra-precision finishing of the inner surfaces of thin-shellcomponents, based on the principles of magnetorheological elastomer (MRE) polishing.The methodology involves the application of a magnetic field to the outer surface of the compo nent,enabling precise control of the MRE pressure on the inner surface,thereby facilitating uniform polishing. Magneto-elastic coupling simulations of the MRE were conducted using COMSOL Multiphysics software to determine the polishing pressure,its distribution across the component surface,and the velocity distribution within the polishing area. A material removal function model was developed based on the Preston equation,which was subsequently discretized and sampled to derive the material removal vector. The residence time at each point in the polishing area was calculated using the non-negative least squares method.To validate the proposed approach,a polishing experiment was conducted under a magnetic field of 0.32T , utilizing a magnetorheological MRE device to polish a fused quartz glass workpiece measuring for a duration of 78 minutes. The experimental results indicated that controlling the residence time at each point achieved an average material removal depth of 84.4nm ,with a fluctuation range of 10.9% ,thereby attaining a uniform surface finish. These findings substantiate the effectiveness of the proposed method in achieving uniform polishing of the inner surfaces of thin-shellcomponents.

Key words:ultra-precision engineering;uniform polishing;thin-shell components;magnetorheological elastomers;material removal depth:magnetic field

1引言

随着航空航天、深海探测和芯片制造等行业的快速发展,对薄壳元件表面质量与面形精度的加工要求不断提高[1-3]。(剩余18071字)

monitor