基于氙灯光源的光谱干涉薄膜测厚技术研究

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中图分类号：TN209文献标志码：A

Abstract： In this paper，a low cost large-range optical measurement system for thin film thickness is designed and built by using the broad spectral characteristics of Xenon lamp and the principle of thin film spectral interferometry. The spectral interference signals of LED light source and widespectrum Xenon lamp source are compared， and a multi-modal method for thin films of different thicknesses is proposed. For thin films covering several hundred nanometers to tens of micrometers， the thickness calculation method can be selected from the Fourier phase gradient method，the peak points method and the spectrum fiting method. Through the construction of the experimental system，a series of 4⋅30μm thick standard PET sheet samples and silicon-based SiO2 film samples are successfully measured， and the results are compared with commercial film thickness measurement systems， which verifies the feasibility of the large range film thickness measurement using the proposed method. The research in this paper can be of reference to the expansion of the range of low cost spectral interferometric film thickness measurement technology.

Keywords： Xenon lamp; broad spectrum; thin film thickness; spectral interference

薄膜工艺在光学元件、通信器件、平板显示和集成电路制造等领域具有不可替代的作用。（剩余9785字）