低温多晶硅氧化物显示驱动技术及氢扩散行为的研究进展

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关键词：低温多晶硅氧化物；金属氧化物；低温多晶硅；薄膜晶体管；氢扩散 中图分类号： TN321+.5 文献标识码：Adoi：1O.37188/CJLCD.2025-0074 CSTR：32172.14.CJLCD.2025-0074

Abstract： Low temperature polycrystaline oxide （LTPO） display technology is a new integrated display technology that integrates low temperature polycrystalline silicon （LTPS）and metal oxide semiconductors （MOS）to achieve high performance and low power consumption display solutions. During the LTPO integration process， hydrogen may difuse from the low-temperature polysilicon layer to the metal oxide layer，resulting in device threshold voltage drift and deterioration of stability，affecting display product performance. The differences of hydrogen in LTPS and MOS devices and the effcts of hydrogen on

MOS devices are discussed in detail. Two types of hydrogen blocking methods for MOS devices are summarized ： using diferent dielectric layers and ion doping technology. In addition，the paper also arranges the hydrogen barrer for LTPO devices to improve the stability and reliability of LTPO devices.Finally， the wider application of LTPO technology in the field of high performance display through hydrogen blocking is prospected.

Key words： LTPO；metal oxide;low temperature polysilicon； TFT； hydrogen diffusion

1引言

为了满足新兴显示如柔性、可穿戴设备对提升显示性能的挑战，研究人员基于显示电路的最基本单元，提出了金属氧化物半导体（MetalOxideSemiconductor，MOS）与低温多晶硅（Low TemperaturePolycrystallineSilicon，LTPS）两大备受欢迎的半导体材料的集成制备，将其分别作为驱动电路原件和开关控制原件。（剩余24666字）